Kompaktowy system semi-preparatywny (10 ml/min)
High effective Compact semi-preparative system containing UV-VIS DAD detector, analytical gradient pump with degasser, automatic inject valve and fraction collector. Detector allows absorbance measuring on four wavelengths at the same time or scanning through entire spectra.
System kontrolowany jest za pomocą wbudowanego komputera z ekranem dotykowym
Modular solution allows to configure the unit according to customer needs. This system contains detector with wavelength range 200 – 800 nm, pump with flow rate up to 10 ml/min and fraction collector.
It is UV-VIS diode array detector, which allow measuring absorbance of four wavelengths in range of 200–800 nm simultaneously in one cell just as scanning of whole spectra. Standardly is assembled with preparative cell HPLC10 L, but other cells are available.
Fractions are collected according to chosen method which is simply created using touch screen. Racks for 8, 21,40 ml tubes.
Valve is driven by a stepmotor and it is automatically switched by software. System also allows manual sample injection by opened column.
Installed industrial PC with Intel Atom 4 core processor. OS Linux, Touch screen 12,1“ 1024 x 786, SW QUEEN controlls: gradient, flow rate, wavelengths, fractions collection etc. Remote administration is available.
Modified for compact system, analytical gradient pump with degasser and with flow rate up to 10 ml/min (40 MPa, 5082 PSI). Unit software includes new learning algorithm for pulsation suppression and many testing and diagnostic functions.Four gradient valves allow to change mobile phases without bottles alternation.
|COMPACT PREPARATIVE SYSTEM|
|Interface||3xUSB, 2xLAN, RS232|
|Power supply||100 - 240 V AC|
|Power input||400 W|
|Dimensions (W x H x D)||500 x 678 x 482 mm (19.69 x 26.69 x 18.98")|
|Weight||55 kg (121.30 lb)|
|Wavelength range||200 - 800 nm (256 elements on CCD)|
|Number of channels (Signals)||4|
|Scan||200 - 800 nm,up to 20 Hz, step 1 nm|
|Typical spectral half-width||10 mn|
|Accuracy of adjustment / Reproducibility||± 1 nm / ±0.5 nm|
|Noise level at test cell (254 nm, TC 0.75s)||± 5 x 10-5 AU|
|Drift at test cell (254 nm after 1 h)||1 x 10-3 AU/hr|
|Materials in contact with mobile phase||FEP; fused silica, stainless steel, PEEK|
|Time constant (T63)||0.5 s, 0.75 s, 1.0 s, 2.0 s, 4.0 s, 8.0 s, 16.0 s, 0.2 s, 0.1 s|
|EC08 48 tubes of 8 ml|
|Available racks (two racks per unit)||EC21 36 tubes of 21 ml|
|EC40 24 tubes of 40 ml|
|Wetted materials||FEP, Tefzel®, PPS, KEL-F, PTFE, PEEK, SS 316, SIMAX glass|
|Input tubing||OD 1/8“ x ID 1/16“ FEP|
|Flow rate||0.02 - 10.00 ml/min|
|Maximum operating pressure||40 MPa (5082 PSI)|
|Repeatability of flow rate adjusting||± 0.5 %|
|Accuracy of flow rate setting||± 2 %|
|Wetted materials||stainless steel, sapphire, KEL-F, seals*|
|Output capillary outer diameter||1/16”|
|Input tubing outer diameter||1/8”|
|Gradient valves control module - OPTIONALLY||Up to four valves|